Precision Lapping&Polishing Machine
Precision Lapping & Polishing consumables

Precision Lapping & Polishing consumables Including
Calcined Aljuminium Oxide Powder、Glass Substrate、Wax、Wax Cleaning Fluid、Polishing Fluid、Polishing Pad、Lapping&Polishing Plate、Plate conditioners 、Jig etc.

Polishing Pad

Product Diameter: 300mm, 350mm, 400mm,420mm,600mm.

Product Thickness:0.5 – 3.0mm.

Chemical Polishing Cloth is designed to satisfy the exacting requirements of chemo-mechanical polishing. The black napped urethane surface layer is intrinsic to the substrate giving superior nap strength and longer pad life.

Chemical Polishing pads are supplied with a protected self-adhesive backing and each cloth is hermetically sealed in a polythene sachet. 

Product Diameter: 300mm, 350mm, 400mm,420mm,600mm.

Product Thickness:0.5 – 3.0mm.

Expanded Polyurethane Polishing Pad is designed to satisfy the exacting requirements of Si and similar material fine polishing. According to different process application, the surface of pad have two kinds of type: groove and non-groove.

Expanded Polyurethane Polishing Pads are supplied with a protected self-adhesive backing and each cloth is hermetically sealed in a polythene sachet.

Calcined Aljuminium Oxide Powder 

Technical Specification:

Powder size: 0.05um – 15um

Colour: White

Shape :Hexagonal Platelet

Specific Gravity:3.8 g/cc

Hardness, Moh:9.0

Wax Cleaning Fluid

Product type: MCF Wax Cleaning Fluid

Appearance: Colourless, mobile fluid

Boiling point: 352℉

Flash point: 118℉ TCC (44℃)

Viscosity (cps): 6

PH: 7.8

Refractive Index: 1.52

Water content (ppm): <50

Colour APHA: <50Colour

MCF wax cleaning Fluid is designed to be compatible with many types of material. When used correctly, it will not affect the following: Metals and metal alloys, glasses and ceramics, inorganic crystals, phenolics, epoxies, melamine, alkydes, fibreglass.

It will dissolve the following: Waxes, pitch, grease, tar, polystyrene.

Polishing Fluid

Product type: PF1 Polishing Fluid

Appearance: Opaque

PH: (At G/1 H2O) 5.0 - 10.1

Boiling point: 100°C

Typical Analysis:

Formaldehyde: <1.0% Ethylene glycol: 4 - 5%

Amorphous silica: 15 - 50% 

Product type: Chemical Polishing Fluid

Appearance: White suspension

pH: 11.4

Boiling point: 100°C

Typical Analysis:

Sodium hypochlorite: 7 - 8%

Aluminium oxide: 8 - 10% 

MCF polishing fluid have been developed to suit a wide range of polishing applications in the semiconductor and optoelectronic industries. Both of products produce polishes of the highest quality and are produced at our own purpose built materials processing laboratories. The product codes used in the Ordering Data table should be quoted when ordering these products.

Glass Substrate

Product size: 86mm、112mm、160mm.

TTV: 1um

Condition: pre-lapped parallel, two faces polished

Wax

Product Type: Quartz Wax

Description: Tan coloured, medium hard synthetic wax

Melting Point: 157-162°C 

Product Type: Plasticised Bonding Wax

Description: Solid, containing Paraffin wax > 99% Polisobutylene < 1%

Melting Point: 56- 57°C

Product Type: High Melting Point Thin Film Bonding Wax Description: Tan coloured, medium hard synthetic wax Melting Point: 157-162°C

 


Polishing Pad

Product Diameter: 300mm, 350mm, 400mm,420mm,600mm.

Product Thickness:0.5 – 3.0mm.

Chemical Polishing Cloth is designed to satisfy the exacting requirements of chemo-mechanical polishing. The black napped urethane surface layer is intrinsic to the substrate giving superior nap strength and longer pad life.

Chemical Polishing pads are supplied with a protected self-adhesive backing and each cloth is hermetically sealed in a polythene sachet. 

Product Diameter: 300mm, 350mm, 400mm,420mm,600mm.

Product Thickness:0.5 – 3.0mm.

Expanded Polyurethane Polishing Pad is designed to satisfy the exacting requirements of Si and similar material fine polishing. According to different process application, the surface of pad have two kinds of type: groove and non-groove.

Expanded Polyurethane Polishing Pads are supplied with a protected self-adhesive backing and each cloth is hermetically sealed in a polythene sachet.

Calcined Aljuminium Oxide Powder 

Technical Specification:

Powder size: 0.05um – 15um

Colour: White

Shape :Hexagonal Platelet

Specific Gravity:3.8 g/cc

Hardness, Moh:9.0

Wax Cleaning Fluid

Product type: MCF Wax Cleaning Fluid

Appearance: Colourless, mobile fluid

Boiling point: 352℉

Flash point: 118℉ TCC (44℃)

Viscosity (cps): 6

PH: 7.8

Refractive Index: 1.52

Water content (ppm): <50

Colour APHA: <50Colour

MCF wax cleaning Fluid is designed to be compatible with many types of material. When used correctly, it will not affect the following: Metals and metal alloys, glasses and ceramics, inorganic crystals, phenolics, epoxies, melamine, alkydes, fibreglass.

It will dissolve the following: Waxes, pitch, grease, tar, polystyrene.

Polishing Fluid

Product type: PF1 Polishing Fluid

Appearance: Opaque

PH: (At G/1 H2O) 5.0 - 10.1

Boiling point: 100°C

Typical Analysis:

Formaldehyde: <1.0% Ethylene glycol: 4 - 5%

Amorphous silica: 15 - 50% 

Product type: Chemical Polishing Fluid

Appearance: White suspension

pH: 11.4

Boiling point: 100°C

Typical Analysis:

Sodium hypochlorite: 7 - 8%

Aluminium oxide: 8 - 10% 

MCF polishing fluid have been developed to suit a wide range of polishing applications in the semiconductor and optoelectronic industries. Both of products produce polishes of the highest quality and are produced at our own purpose built materials processing laboratories. The product codes used in the Ordering Data table should be quoted when ordering these products.

Glass Substrate

Product size: 86mm、112mm、160mm.

TTV: 1um

Condition: pre-lapped parallel, two faces polished

Wax

Product Type: Quartz Wax

Description: Tan coloured, medium hard synthetic wax

Melting Point: 157-162°C 

Product Type: Plasticised Bonding Wax

Description: Solid, containing Paraffin wax > 99% Polisobutylene < 1%

Melting Point: 56- 57°C

Product Type: High Melting Point Thin Film Bonding Wax Description: Tan coloured, medium hard synthetic wax Melting Point: 157-162°C